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Process-Specific Chemical Guides

Deep-dive application guides matching the right chemical grade to your specific process — with specification tables, grade selection logic, and FAQs.

Electronic Grade IPA

IPA for Semiconductor Wafer Cleaning

Isopropyl alcohol is the highest-volume wet process solvent in semiconductor manufacturing, consumed at every node from …

Assay (GC-FID)≥99.0% (G1) to ≥99.9999% (G5)
Total Metals (ICP-MS)≤50 ppb (G1) to <0.1 ppb (G5)
Particles ≥0.5 μm (LPC)≤500
Full Grade Guide
PGMEA

PGMEA for EUV & ArF Immersion Lithography

PGMEA is the dominant primary solvent in all advanced photoresist formulations from KrF through EUV, maintained by its u…

Assay (GC)≥99.0% (G1) to ≥99.999% (G5)
Total Metals (ICP-MS)≤50 ppb (G1) to <0.1 ppb (G5)
Acetic Acid (GC)≤50 ppm (G1) to ≤5 ppm (G5)
Full Grade Guide
NMP (N-Methyl-2-pyrrolidone)

NMP for Li-Battery Cathode Electrode Slurry

NMP is the irreplaceable solvent for PVDF binder dissolution in lithium-ion battery cathode electrode manufacturing, ena…

Assay (GC)≥99.0% (G1) to ≥99.999% (G5)
Water (Karl Fischer)≤1000 ppm (G1) to ≤20 ppm (G5)
Fe (ICP-MS)≤50 ppb (G1) to <0.05 ppb (G5)
Full Grade Guide

Application Support

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