Applications
Process Chemistry for
7 Industry Segments
From sub-3nm logic wafer cleaning to EV battery electrolyte and HPLC pharmaceutical analysis — PureTech provides the right grade for every application.
Market Applications
Application by Industry Segment
Each market segment lists the key chemistry and links to full product specification sheets.
Logic & High-Performance Computing
FinFET / GAA / EUV · <3nm Nodes
Sub-3nm logic and gate-all-around (GAA) devices require total metal contamination below 0.1 ppb per element. Our SEMI G5 IPA, ethanol, acetone, and PGMEA are EUV-compatible and validated for post-FEOL etch rinse, BEOL copper barrier rinse, Marangoni drying, photomask cleaning, and FOUP maintenance.
Key Chemistry
DRAM & 3D NAND Flash Memory
High-Volume · IBC / Bulk Supply
Memory fabs consume IPA and cleaning solvents in high volumes across dozens of wet cleaning steps per wafer pass. PureTech delivers lot-to-lot consistency with CoA on every shipment. IPA and acetone support multi-step CMP post-clean and final rinse sequences in DRAM capacitor and 3D NAND channel hole fabrication.
Key Chemistry
Advanced & Heterogeneous Packaging
FOWLP / HBM / 2.5D / 3D-IC / CoW
Fan-out wafer-level packaging, chip-on-wafer, 2.5D interposer, and 3D-IC stacking require precision solvent cleaning. PGMEA and PGME support RDL patterning lithography; NMP dissolves thick polyimide precursors for HDI substrates; IPA provides contamination-free substrate cleaning at every stage.
Key Chemistry
EV Lithium-Ion Battery
NMC / LFP / NCA · Electrolyte & Electrode Slurry
Electronic grade DMC is a critical co-solvent in LiPF₆-based electrolytes (EC/DMC/EMC system). G5 grade DMC with <0.1 ppb metals and ≤10 ppm water ensures minimal LiPF₆ hydrolysis and optimal ionic conductivity. NMP dissolves PVDF binder for NMC and LFP cathode slurry coating in EV gigafactory production lines.
Key Chemistry
Display & OLED
TFT-LCD / AMOLED / MicroLED / Flexible
PGMEA and PGME are the primary solvents for positive photoresist in TFT-LCD array patterning. DMSO and NMP serve as organic light-emitting layer coating solvents in OLED inkjet printing. IPA provides final substrate cleaning. Electronic grade purity ensures zero residue contamination of pixel electrodes.
Key Chemistry
Compound Semiconductor & Photonics
GaN / SiC / InP / GaAs / Si Photonics / VCSEL
GaN power devices, SiC MOSFETs, InP HEMTs, and GaAs solar cells require halide-free IPA with <1 ppb Cl⁻ and F⁻ to prevent surface pitting and ohmic contact degradation. n-Heptane G4 is used for GaN-on-SiC MOCVD reactor cleaning; ethanol for LED and VCSEL device cleaning.
Key Chemistry
HPLC / Pharmaceutical & Bioanalytical
Drug Analysis / QC / LC-MS / Bioanalytical
LC-MS grade acetonitrile is the gold standard reverse-phase mobile phase for pharmaceutical API analysis. HPLC-gradient methanol and ethanol meet strict UV absorbance requirements. Anhydrous THF and DCM support Grignard reactions, GPC polymer analysis, and Fmoc/Boc peptide synthesis. n-Hexane for food fat extraction per ISO 6492.
Key Chemistry
Process Reference
Chemical-to-Process Mapping
Which PureTech product to specify for each process step — from fab to battery factory.
| Process Step | Chemistry | Role | PureTech Product |
|---|---|---|---|
| RCA SC-1 (APM) | IPA rinse after APM | Organic & particle removal | EIPA G4/G5 |
| RCA SC-2 (HPM) | IPA rinse after HPM | Metal ion removal rinse | EIPA G4/G5 |
| Piranha (SPM) | Acetone rinse assist | Photoresist & organic strip | Acetone G4 |
| Resist EBR Coat | PGME / PGMEA | Edge bead removal & EBR coat | PGME G4/G5 |
| ArF/EUV Litho | PGMEA primary solvent | Photoresist formulation | PGMEA G4/G5 |
| NTD Development | Butyl acetate solvent | Negative-tone develop (EUV) | BuOAc G4 |
| Thick PR Strip | NMP / Acetone | Post-etch resist removal | NMP G4 |
| PI/BCB Coating | NMP solvent | Polyimide precursor coating | NMP G4/G5 |
| CMP Post-Clean | IPA SRD | Brush-scrub spin-rinse-dry | EIPA G4/G5 |
| Marangoni Dry | IPA G5 vapor | Stiction-free final dry | EIPA G5 |
| Li-Battery Slurry | NMP | PVDF binder dissolution | NMP G4/G5 |
| Electrolyte Mix | DMC co-solvent | LiPF₆ in EC/DMC/EMC | DMC G4/G5 |
| HPLC Analysis | MeCN / MeOH | Reverse-phase mobile phase | ACN LC-MS |
Application Support
Process-Specific
Technical Guidance
Our FAE team provides compatibility data, qualification protocols, and on-site process engineering support.