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Ammonium Hydroxide (Electronic Grade)

NH₄OH · CAS 1336-21-6

Ultra-high purity ammonium hydroxide is the key alkaline component of RCA SC-1 (APM: ammonium-peroxide mixture), the industry standard solution for particle and organic contaminant removal from silicon wafer surfaces. G5 grade with <0.1 ppb total metals is specified for sub-5nm FEOL cleaning.

RCA SC-1 (APM) particle & organic removalDilute APM (1:1:100) advanced node cleaningPost-CMP alkaline cleaning bathPhotoresist strip (alkaline)Copper interconnect surface conditioningGate oxide pre-clean (with H₂O₂)

Molecular Weight

35.05 g/mol

Boiling Point

38 °C (28%)

Density

0.90 g/mL (28–30%)

Molecular Formula

NH₄OH
SEMI C12
CAS Number1336-21-6
Boiling Point38 °C (28%)
Density0.90 g/mL (28–30%)
MW35.05 g/mol

Available Grades

G2G3G4G5

Analytical Specification

Analytical Specification Table

All values represent maximum allowable limits unless noted ≥. A lot-specific Certificate of Analysis (CoA) with ICP-MS, LPC, and GC data is issued for every shipment. Full data packages available on request.

ParameterTest MethodUnitG4G5 ★
Assay (NH₃)Titration%28.0–30.028.0–30.0
Total MetalsICP-MSppb ea.≤0.5<0.1
Fe (Iron)ICP-MSppb≤0.2<0.05
Cu (Copper)ICP-MSppb≤0.1<0.05
Cl⁻ (Chloride)ICppb≤50≤10
Particles ≥0.5μmLPCct/mL≤10≤5

★ G5 = SEMI C1 Tier D (6N grade). All metal values by ICP-MS. Particle counts by in-line LPC during ISO Class 3 fill. CoA available on request.

Grade Comparison

G1 → G5 Purity Scale

Select the grade that matches your process node and contamination budget. Every grade is available from PureTech with full lot CoA and ICP-MS data.

Electronic Grade Purity Comparison — SEMI C1 StandardG1 → G5
GradePurity (GC)Metals (ICP)ParticlesWater (KF)Process Node
G1
≥99.0%
≤50 ppb≤500/mL≤500 ppmPCB / Display / Solar
G2
≥99.9%
≤10 ppb≤100/mL≤50 ppm≥180nm Mature Node
G3
≥99.99%
≤2 ppb≤20/mL≤20 ppm45–180nm
G4
≥99.999%
≤0.5 ppb≤10/mL≤10 ppm7–45nm
G5
≥99.9999%
<0.1 ppb≤5/mL≤5 ppm<7nm / EUV / Marangoni

All grades tested by ICP-MS (28 elements), in-line LPC (ISO Class 3 fill), and Karl Fischer titration. G5 = SEMI C1 Tier D. Full CoA per lot.  Request CoA template →

Application Areas

Where Ammonium Hydroxide Is Used

Semiconductor Process

  • RCA SC-1 (APM) particle & organic removal
  • Dilute APM (1:1:100) advanced node cleaning
  • Post-CMP alkaline cleaning bath
  • Photoresist strip (alkaline)
  • Copper interconnect surface conditioning
  • Gate oxide pre-clean (with H₂O₂)

Laboratory & Analytical

  • pH adjustment to alkaline range
  • complexometric titrations
  • qualitative analysis

Industrial & Other

  • PCB cleaning
  • refrigerant R-717 (industrial grade)
  • fertilizer (industrial)

Packaging & Supply

Available Container Formats

1 L
5 L
20 L
200 L

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Our application engineers respond with full CoA data, ICP-MS reports, and supply chain details within one business day.