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Tetramethylammonium Hydroxide (TMAH)

(CH₃)₄NOH · CAS 75-59-2

Tetramethylammonium hydroxide (TMAH) is the universal photoresist developer for positive-tone resists in semiconductor lithography. The standard 2.38% w/w aqueous solution develops exposed positive chemically amplified resists at all lithography nodes. Also used as an anisotropic silicon etchant in MEMS fabrication.

Positive photoresist development (2.38% aqueous)KrF, ArF, EUV CAR photoresist developerAnisotropic silicon etching for MEMS (25% TMAH at 80°C)Aluminum etch at low concentrationLCD array TFT photoresist developmentPost-develop rinse bath additive

Molecular Weight

91.15 g/mol

Boiling Point

> 100 °C

Density

1.02 g/mL (25%)

Molecular Formula

(CH₃)₄NOH
SEMI C12
CAS Number75-59-2
Boiling Point> 100 °C
Density1.02 g/mL (25%)
MW91.15 g/mol

Available Grades

G2G3G4G5

Analytical Specification

Analytical Specification Table

All values represent maximum allowable limits unless noted ≥. A lot-specific Certificate of Analysis (CoA) with ICP-MS, LPC, and GC data is issued for every shipment. Full data packages available on request.

ParameterTest MethodUnitG4G5 ★
Assay (TMAH)Titration%2.35–2.402.37–2.39
Total MetalsICP-MSppb ea.≤0.5<0.1
Na (Sodium)ICP-MSppb≤1<0.1
Cl⁻ (Chloride)ICppb≤50≤10
Particles ≥0.2μmLPCct/mL≤50≤20

★ G5 = SEMI C1 Tier D (6N grade). All metal values by ICP-MS. Particle counts by in-line LPC during ISO Class 3 fill. CoA available on request.

Grade Comparison

G1 → G5 Purity Scale

Select the grade that matches your process node and contamination budget. Every grade is available from PureTech with full lot CoA and ICP-MS data.

Electronic Grade Purity Comparison — SEMI C1 StandardG1 → G5
GradePurity (GC)Metals (ICP)ParticlesWater (KF)Process Node
G1
≥99.0%
≤50 ppb≤500/mL≤500 ppmPCB / Display / Solar
G2
≥99.9%
≤10 ppb≤100/mL≤50 ppm≥180nm Mature Node
G3
≥99.99%
≤2 ppb≤20/mL≤20 ppm45–180nm
G4
≥99.999%
≤0.5 ppb≤10/mL≤10 ppm7–45nm
G5
≥99.9999%
<0.1 ppb≤5/mL≤5 ppm<7nm / EUV / Marangoni

All grades tested by ICP-MS (28 elements), in-line LPC (ISO Class 3 fill), and Karl Fischer titration. G5 = SEMI C1 Tier D. Full CoA per lot.  Request CoA template →

Application Areas

Where Tetramethylammonium Hydroxide Is Used

Semiconductor Process

  • Positive photoresist development (2.38% aqueous)
  • KrF, ArF, EUV CAR photoresist developer
  • Anisotropic silicon etching for MEMS (25% TMAH at 80°C)
  • Aluminum etch at low concentration
  • LCD array TFT photoresist development
  • Post-develop rinse bath additive

Laboratory & Analytical

  • Strong base for organic synthesis
  • phase-transfer catalyst

Industrial & Other

  • LCD TFT array photoresist development
  • PCB solder mask development

Packaging & Supply

Available Container Formats

1 L
5 L
20 L
200 L
IBC

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Our application engineers respond with full CoA data, ICP-MS reports, and supply chain details within one business day.