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Hydrogen Peroxide (Electronic Grade)

H₂O₂ · CAS 7722-84-1

The most versatile oxidant in semiconductor wet processing. Electronic grade H₂O₂ (30% and 50% concentrations) is essential for RCA SC-1 (APM: NH₄OH/H₂O₂/H₂O), RCA SC-2 (HPM: HCl/H₂O₂/H₂O), piranha solution (SPM: H₂SO₄/H₂O₂), and as the primary oxidizer in copper CMP slurry formulations.

RCA SC-1 (APM) particle & organic removal (with NH₄OH)RCA SC-2 (HPM) metal ion removal (with HCl)Piranha solution (SPM) photoresist & organic strip (with H₂SO₄)Cu / W CMP slurry oxidizerSilicon native oxide re-growth after HF stripOzone-compatible oxidant for FEOL clean

Molecular Weight

34.01 g/mol

Boiling Point

150.2 °C

Density

1.11 g/mL (30%)

Molecular Formula

H₂O₂
SEMI C30
CAS Number7722-84-1
Boiling Point150.2 °C
Density1.11 g/mL (30%)
MW34.01 g/mol

Available Grades

G2G3G4G5

Analytical Specification

Analytical Specification Table

All values represent maximum allowable limits unless noted ≥. A lot-specific Certificate of Analysis (CoA) with ICP-MS, LPC, and GC data is issued for every shipment. Full data packages available on request.

ParameterTest MethodUnitG4G5 ★
Assay (H₂O₂)Titration%29.0–32.029.0–32.0
Total MetalsICP-MSppb ea.≤0.5<0.1
Fe (Iron)ICP-MSppb≤0.2<0.05
Na (Sodium)ICP-MSppb≤0.3<0.1
Total Organic CTOCppm≤1≤0.5
Particles ≥0.5μmLPCct/mL≤10≤5

★ G5 = SEMI C1 Tier D (6N grade). All metal values by ICP-MS. Particle counts by in-line LPC during ISO Class 3 fill. CoA available on request.

Grade Comparison

G1 → G5 Purity Scale

Select the grade that matches your process node and contamination budget. Every grade is available from PureTech with full lot CoA and ICP-MS data.

Electronic Grade Purity Comparison — SEMI C1 StandardG1 → G5
GradePurity (GC)Metals (ICP)ParticlesWater (KF)Process Node
G1
≥99.0%
≤50 ppb≤500/mL≤500 ppmPCB / Display / Solar
G2
≥99.9%
≤10 ppb≤100/mL≤50 ppm≥180nm Mature Node
G3
≥99.99%
≤2 ppb≤20/mL≤20 ppm45–180nm
G4
≥99.999%
≤0.5 ppb≤10/mL≤10 ppm7–45nm
G5
≥99.9999%
<0.1 ppb≤5/mL≤5 ppm<7nm / EUV / Marangoni

All grades tested by ICP-MS (28 elements), in-line LPC (ISO Class 3 fill), and Karl Fischer titration. G5 = SEMI C1 Tier D. Full CoA per lot.  Request CoA template →

Application Areas

Where Hydrogen Peroxide Is Used

Semiconductor Process

  • RCA SC-1 (APM) particle & organic removal (with NH₄OH)
  • RCA SC-2 (HPM) metal ion removal (with HCl)
  • Piranha solution (SPM) photoresist & organic strip (with H₂SO₄)
  • Cu / W CMP slurry oxidizer
  • Silicon native oxide re-growth after HF strip
  • Ozone-compatible oxidant for FEOL clean

Laboratory & Analytical

  • Oxidative digestion
  • bleaching agent
  • disinfection

Industrial & Other

  • PCB etch oxidizer
  • textile bleaching
  • paper pulp bleaching
  • wastewater treatment

Battery & Energy Storage

Battery separator surface treatment
electrolyte additive research

Packaging & Supply

Available Container Formats

1 L
5 L
20 L
200 L

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Our application engineers respond with full CoA data, ICP-MS reports, and supply chain details within one business day.