Propylene Glycol Monomethyl Ether (PGME)
CH₃OCH₂CH(OH)CH₃ · CAS 107-98-2
Electronic grade PGME is the industry-leading edge-bead removal (EBR) solvent and photoresist formulation co-solvent. Its excellent dissolution power for positive chemically-amplified resists (CAR), low surface tension, and controlled evaporation rate make it essential for ArF, KrF, and EUV lithography patterning.
Molecular Weight
90.12 g/mol
Boiling Point
120 °C
Density
0.921 g/mL
Molecular Formula
Available Grades
Analytical Specification
Analytical Specification Table
All values represent maximum allowable limits unless noted ≥. A lot-specific Certificate of Analysis (CoA) with ICP-MS, LPC, and GC data is issued for every shipment. Full data packages available on request.
| Parameter | Test Method | Unit | G4 | G5 ★ | AR |
|---|---|---|---|---|---|
| Assay (GC) | GC-FID | % | ≥99.99 | ≥99.999 | ≥99.5 |
| Water Content (KF) | Karl Fischer | ppm | ≤30 | ≤10 | ≤2000 |
| Total Metals (ICP-MS) | ICP-MS | ppb ea. | ≤0.5 | <0.1 | — |
| Propylene Glycol | GC-FID | ppm | ≤50 | ≤20 | ≤200 |
| Methoxypropanol isomers | GC-FID | ppm | ≤100 | ≤50 | — |
| Acidity (as HAc) | Titration | ppm | ≤2 | ≤1 | ≤10 |
| Residue on Evaporation | Gravimetric | ppm | ≤2 | ≤0.5 | ≤10 |
| Color (APHA) | ASTM D1209 | Hazen | ≤5 | ≤5 | ≤10 |
| Peroxide (as H₂O₂) | Iodometric | ppm | ≤1 | ≤0.5 | ≤5 |
★ G5 = SEMI C1 Tier D (6N grade). All metal values by ICP-MS. Particle counts by in-line LPC during ISO Class 3 fill. CoA available on request.
Grade Comparison
G1 → G5 Purity Scale
Select the grade that matches your process node and contamination budget. Every grade is available from PureTech with full lot CoA and ICP-MS data.
All grades tested by ICP-MS (28 elements), in-line LPC (ISO Class 3 fill), and Karl Fischer titration. G5 = SEMI C1 Tier D. Full CoA per lot. Request CoA template →
Application Areas
Where Propylene Glycol Monomethyl Ether Is Used
Semiconductor Process
- Edge bead removal (EBR) in spin-coating process
- ArF / KrF / EUV photoresist formulation co-solvent
- Anti-reflective coating (ARC) formulation solvent
- Bottom anti-reflective coating (BARC) solvent
- EUV metal oxide resist (MOR) developer
- Thick film photoresist dilution
- Polyimide (PI) precursor solution solvent
- OLED pixel definition layer (PDL) coating solvent
Laboratory & Analytical
- Polymer coating research
- UV-curable ink formulation
- surface energy studies
Industrial & Other
- Inkjet printing ink formulation
- industrial coating manufacturing
- leather finishing coating
Packaging & Supply
Available Container Formats
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