Electronic Grade IPA (EIPA)
(CH₃)₂CHOH · CAS 67-63-0
Ultra-high purity isopropyl alcohol from G2 to G5 (6N grade), engineered for the most demanding semiconductor wet cleaning, Marangoni drying, CMP post-clean, EUV tool maintenance, and advanced packaging substrate cleaning. Every lot verified by 28-element ICP-MS and liquid particle counting (LPC).
Molecular Weight
60.10 g/mol
Boiling Point
82.6 °C
Density
0.786 g/mL
Molecular Formula
Available Grades
Analytical Specification
Analytical Specification Table
All values represent maximum allowable limits unless noted ≥. A lot-specific Certificate of Analysis (CoA) with ICP-MS, LPC, and GC data is issued for every shipment. Full data packages available on request.
| Parameter | Test Method | Unit | G2 | G3 | G4 | G5 ★ |
|---|---|---|---|---|---|---|
| Assay (GC) | GC-FID | % | ≥99.9 | ≥99.99 | ≥99.999 | ≥99.9999 |
| Water Content (KF) | Karl Fischer | ppm | ≤50 | ≤20 | ≤10 | ≤5 |
| Total Metals (ICP-MS) | ICP-MS | ppb ea. | ≤10 | ≤2 | ≤0.5 | <0.1 |
| Na (Sodium) | ICP-MS | ppb | ≤5 | ≤1 | ≤0.3 | <0.1 |
| Fe (Iron) | ICP-MS | ppb | ≤2 | ≤0.5 | ≤0.2 | <0.05 |
| Cu (Copper) | ICP-MS | ppb | ≤1 | ≤0.3 | ≤0.1 | <0.03 |
| Cr (Chromium) | ICP-MS | ppb | ≤1 | ≤0.3 | ≤0.1 | <0.03 |
| Particles ≥0.5 μm | LPC (in-line) | ct/mL | ≤100 | ≤20 | ≤10 | ≤5 |
| Particles ≥0.2 μm | LPC (in-line) | ct/mL | — | ≤100 | ≤50 | ≤20 |
| Acetone | GC-MS | ppm | ≤100 | ≤20 | ≤5 | ≤1 |
| Residue on Evaporation | Gravimetric | ppm | ≤5 | ≤2 | ≤1 | ≤0.5 |
| Anions (Cl⁻, F⁻, SO₄²⁻) | IC | ppb ea. | ≤5 | ≤2 | ≤0.5 | <0.1 |
| Color (APHA) | ASTM D1209 | Hazen | ≤5 | ≤5 | ≤5 | ≤5 |
★ G5 = SEMI C1 Tier D (6N grade). All metal values by ICP-MS. Particle counts by in-line LPC during ISO Class 3 fill. CoA available on request.
Grade Comparison
G1 → G5 Purity Scale
Select the grade that matches your process node and contamination budget. Every grade is available from PureTech with full lot CoA and ICP-MS data.
All grades tested by ICP-MS (28 elements), in-line LPC (ISO Class 3 fill), and Karl Fischer titration. G5 = SEMI C1 Tier D. Full CoA per lot. Request CoA template →
Application Areas
Where Electronic Grade IPA Is Used
Semiconductor Process
- Post-etch & post-CMP wafer rinse (SC-1/SC-2 final rinse)
- Marangoni drying — stiction-free drying for MEMS & sub-5nm nodes
- CMP brush-scrub and spin-rinse-dry (SRD) sequences
- EUV lithography tool cleaning & maintenance
- Photomask & reticle wet cleaning
- FOUP / wafer carrier cleaning
- Advanced packaging substrate clean (FOWLP, CoW, HBM, 2.5D/3D-IC)
- GaN, SiC, InP compound semiconductor substrate degreasing
- OLED & MicroLED display substrate preparation
- MEMS device release cleaning & stiction prevention
Laboratory & Analytical
- HPLC mobile phase modifier
- GC sample preparation
- pharmaceutical synthesis final rinse
Industrial & Other
- PCB & SMT board cleaning
- optical fiber end-face cleaning
- medical device sterilization
Battery & Energy Storage
Packaging & Supply
Available Container Formats
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Our application engineers respond with full CoA data, ICP-MS reports, and supply chain details within one business day.