Nitric Acid (Electronic Grade)
HNO₃ · CAS 7697-37-2
Electronic grade nitric acid for metal surface passivation, aqua regia preparation (HNO₃/HCl 1:3), and stainless steel/titanium surface treatment. Also used in selective tungsten (W) and molybdenum (Mo) etching in advanced CMOS gate and contact formation.
Molecular Weight
63.01 g/mol
Boiling Point
83 °C (68%)
Density
1.40 g/mL (68%)
Molecular Formula
Available Grades
Analytical Specification
Analytical Specification Table
All values represent maximum allowable limits unless noted ≥. A lot-specific Certificate of Analysis (CoA) with ICP-MS, LPC, and GC data is issued for every shipment. Full data packages available on request.
| Parameter | Test Method | Unit | G4 |
|---|---|---|---|
| Assay | Titration | % | 68.0–70.0 |
| Total Metals | ICP-MS | ppb ea. | ≤0.5 |
| Fe (Iron) | ICP-MS | ppb | ≤0.2 |
| Cl⁻ (Chloride) | IC | ppb | ≤50 |
★ G5 = SEMI C1 Tier D (6N grade). All metal values by ICP-MS. Particle counts by in-line LPC during ISO Class 3 fill. CoA available on request.
Grade Comparison
G1 → G5 Purity Scale
Select the grade that matches your process node and contamination budget. Every grade is available from PureTech with full lot CoA and ICP-MS data.
All grades tested by ICP-MS (28 elements), in-line LPC (ISO Class 3 fill), and Karl Fischer titration. G5 = SEMI C1 Tier D. Full CoA per lot. Request CoA template →
Application Areas
Where Nitric Acid Is Used
Semiconductor Process
- Aqua regia (HNO₃/HCl) noble metal etching
- Tungsten (W) selective etch (with H₂O₂)
- Metal surface passivation
- Titanium/TiN surface preparation
- Tool and wet bench cleaning
Laboratory & Analytical
- Trace metal digestion (ICP-MS sample prep)
- standard solution preparation
- qualitative analysis
Industrial & Other
- PCB through-hole cleaning
- stainless steel passivation
- fertilizer production
Packaging & Supply
Available Container Formats
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Our application engineers respond with full CoA data, ICP-MS reports, and supply chain details within one business day.