Specialty chemistry for formulation and process use

Often considered for

ArF immersion photoresist primary solvent (193i)

Often considered for

Edge bead removal (EBR) in spin-coating process

Often considered for

Thick-film positive photoresist stripping (3

Often considered for

OLED organic light-emitting layer inkjet printing solvent

Often considered for

LCD PI alignment layer co-solvent (with NMP)

Often considered for

Polycarbonate synthesis intermediate

Often considered for

Standard EC/DMC/EMC (1:1:1) Li-ion electrolyte

Often considered for

Li-ion battery electrolyte co-solvent (EC/DMC/DEC or EC/DEC)

Often considered for

Positive photoresist development (2.38% aqueous)