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Electronic G1Electronic Grade Solvents

Methanol Electronic G1 Grade

CH₃OH · CAS 67-56-1

G1 methanol for TFT-LCD array cleaning, photoresist co-solvent in mature node lithography (365nm I-line, 436nm G-line), and general display fab use. Controlled metal and residue specs ensure clean photoresist films and contamination-free array surfaces.

TFT-LCD array photoresist formulation co-solventI-line / G-line lithography (365–436nm)Display glass substrate organic cleanFlat panel display (FPD) array cleaning

Molecular Weight

32.04 g/mol

Boiling Point

64.7 °C

Density

0.791 g/mL

Molecular Formula

CH₃OH
CAS Number67-56-1
Boiling Point64.7 °C
Density0.791 g/mL
MW32.04 g/mol

Available Grades

G1

Analytical Specification

Analytical Specification Table

All values represent maximum allowable limits unless noted ≥. A lot-specific Certificate of Analysis (CoA) with ICP-MS, LPC, and GC data is issued for every shipment. Full data packages available on request.

ParameterTest MethodUnitG1
Assay (GC)GC-FID%≥99.0
Water Content (KF)Karl Fischerppm≤1000
Total MetalsICP-OESppb ea.≤50
AcetoneGC-FIDppm≤100
Residue on Evap.Gravimetricppm≤10

★ G5 = SEMI C1 Tier D (6N grade). All metal values by ICP-MS. Particle counts by in-line LPC during ISO Class 3 fill. CoA available on request.

Grade Comparison

G1 → G5 Purity Scale

Select the grade that matches your process node and contamination budget. Every grade is available from PureTech with full lot CoA and ICP-MS data.

Electronic Grade Purity Comparison — SEMI C1 StandardG1 → G5
GradePurity (GC)Metals (ICP)ParticlesWater (KF)Process Node
G1
≥99.0%
≤50 ppb≤500/mL≤500 ppmPCB / Display / Solar
G2
≥99.9%
≤10 ppb≤100/mL≤50 ppm≥180nm Mature Node
G3
≥99.99%
≤2 ppb≤20/mL≤20 ppm45–180nm
G4
≥99.999%
≤0.5 ppb≤10/mL≤10 ppm7–45nm
G5
≥99.9999%
<0.1 ppb≤5/mL≤5 ppm<7nm / EUV / Marangoni

All grades tested by ICP-MS (28 elements), in-line LPC (ISO Class 3 fill), and Karl Fischer titration. G5 = SEMI C1 Tier D. Full CoA per lot.  Request CoA template →

Application Areas

Where Methanol Electronic G1 Grade Is Used

Semiconductor Process

  • TFT-LCD array photoresist formulation co-solvent
  • I-line / G-line lithography (365–436nm)
  • Display glass substrate organic clean
  • Flat panel display (FPD) array cleaning

Laboratory & Analytical

  • General HPLC mobile phase (low-demand methods)
  • extraction solvent

Industrial & Other

  • Biodiesel production
  • paint & lacquer dilution

Battery & Energy Storage

DMC/EMC synthesis solvent

Packaging & Supply

Available Container Formats

4 L
18 L
200 L
IBC

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Technical Quote

Our application engineers respond with full CoA data, ICP-MS reports, and supply chain details within one business day.