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n-Heptane

C₇H₁₆ · CAS 142-82-5

Electronic grade n-heptane for semiconductor wafer substrate degreasing, ArF immersion lithography lens cleaning, and GaN MOCVD reactor maintenance. HPLC grade for normal-phase chromatography and octane number reference standards.

Wafer & substrate hydrocarbon degreasingArF immersion lithography water-repellent topcoat (TARC) solventGaN-on-SiC MOCVD reactor in-situ cleaningImmersion scanner lens maintenance cleaning

Molecular Weight

100.20 g/mol

Boiling Point

98.4 °C

Density

0.684 g/mL

Molecular Formula

C₇H₁₆
CAS Number142-82-5
Boiling Point98.4 °C
Density0.684 g/mL
MW100.20 g/mol

Available Grades

G2G3G4G5PHARMAHPLC-PHPLC-GHPLCLC-MSANHYDROUSARGRINDUSTRIAL

Analytical Specification

Analytical Specification Table

All values represent maximum allowable limits unless noted ≥. A lot-specific Certificate of Analysis (CoA) with ICP-MS, LPC, and GC data is issued for every shipment. Full data packages available on request.

ParameterTest MethodUnitG4HPLC-GAR
Assay (GC)GC-FID%≥99.99≥99.5≥99.0
Water Content (KF)Karl Fischerppm≤20≤20≤500
BenzeneGC-FIDppm≤0.5≤0.5≤1
Total AromaticsGC-FIDppm≤10≤50≤200
Residue on EvaporationGravimetricppm≤2≤2≤5

★ G5 = SEMI C1 Tier D (6N grade). All metal values by ICP-MS. Particle counts by in-line LPC during ISO Class 3 fill. CoA available on request.

Grade Comparison

G1 → G5 Purity Scale

Select the grade that matches your process node and contamination budget. Every grade is available from PureTech with full lot CoA and ICP-MS data.

Electronic Grade Purity Comparison — SEMI C1 StandardG1 → G5
GradePurity (GC)Metals (ICP)ParticlesWater (KF)Process Node
G1
≥99.0%
≤50 ppb≤500/mL≤500 ppmPCB / Display / Solar
G2
≥99.9%
≤10 ppb≤100/mL≤50 ppm≥180nm Mature Node
G3
≥99.99%
≤2 ppb≤20/mL≤20 ppm45–180nm
G4
≥99.999%
≤0.5 ppb≤10/mL≤10 ppm7–45nm
G5
≥99.9999%
<0.1 ppb≤5/mL≤5 ppm<7nm / EUV / Marangoni

All grades tested by ICP-MS (28 elements), in-line LPC (ISO Class 3 fill), and Karl Fischer titration. G5 = SEMI C1 Tier D. Full CoA per lot.  Request CoA template →

Application Areas

Where n-Heptane Is Used

Semiconductor Process

  • Wafer & substrate hydrocarbon degreasing
  • ArF immersion lithography water-repellent topcoat (TARC) solvent
  • GaN-on-SiC MOCVD reactor in-situ cleaning
  • Immersion scanner lens maintenance cleaning

Laboratory & Analytical

  • Normal-phase HPLC mobile phase
  • SFC co-solvent
  • Octane number primary reference fuel (PRF)
  • GC calibration standard

Industrial & Other

  • Aviation fuel octane testing standard
  • rubber vulcanization process
  • adhesive formulation

Packaging & Supply

Available Container Formats

500 mL
2.5 L
5 L
25 L
200 L

Get Started

Request a Sample or
Technical Quote

Our application engineers respond with full CoA data, ICP-MS reports, and supply chain details within one business day.